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The
OSIRIS Mask Designer is a utility prepared to define the exact positions
and shapes of slits in a focal plane mask in order to perform multiobject
spectroscopy (MOS). The Mask Designer can be run either by using a list
of values presenting equatorial coordinates or by defining slit positions
with a mouse and an input FITS format image. To the left there is an example
of the second method of generating masks, drawing the slits over an image
with astrometric data. The OSIRIS Mask Designer was developed by a software
group at GMV |
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Mask Support |
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Mask Support |
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Mask Support |
Last update August 8, 2005, by Héctor Castañeda